The photolithographic technology enables optical coatings to be laterally patterned. In this way it is possible to place an optical coating only on partial areas of a substrate, or to apply several optical coatings on one area. The lateral dimensions of the coated areas are definable within a range from several centimeters to 20 µm. The positioning accuracy has a maximum tolerance of about 1 µm. Basically, all types of coatings and filters can be realized as patterned coatings.

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Filter Arrays
Array of different interference filters on a surface

 

Filter-on-chip
Direct deposition of interference filter arrays onto photodiodes

 

Order Sorting Filters
Array of longwave-pass filters on cover glasses for miniature spectrometers